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Fabrication of three-dimensional polymer quadratic nonlinear grating structures by layer-by-layer direct laser writing technique

Danh Bich Do, Jian Hung Lin, Ngoc Diep Lai, Hung-Chih Kan, Chia Chen Hsu, Appl. Opt. 50, 4664-4670 (2011)

We demonstrate the fabrication of a three-dimensional (3D) polymer quadratic nonlinear (chi(2)) grating structure. By performing layer-by-layer direct laser writing (DLW) and spin-coating approaches, desired photobleached grating patterns were embedded in the guest–host dispersed-red-1/poly(methylmethacrylate) (DR1/PMMA) active layers of an active-passive alternative multilayer structure through photobleaching of DR1 molecules. Polyvinyl-alcohol and SU8 thin films were deposited between DR1/PMMA layers serving as a passive layer to separate DR1/PMMA active layers. After applying the corona electric field poling to the multilayer structure, nonbleached DR1 molecules in the active layers formed polar distribution, and a 3D chi(2) grating structure was obtained. The chi(2) grating structures at different DR1/PMMA nonlinear layers were mapped by laser scanning second harmonic (SH) microscopy, and no cross talk was observed between SH images obtained from neighboring nonlinear layers. The layer-by-layer DLW technique is favorable to fabricating hierarchical 3D polymer nonlinear structures for optoelectronic applications with flexible structural design

Open access paper: doi:10.1364/AO.50.004664

Acknowledgments
This work is a joint research between the LPQM (ENS Cachan, France) and the NanoOptics Lab (Department of Physics, National Chung Cheng University, Taiwan), in the framework of LIA (Laboratoire International Associé)  laboratory.
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