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Quang Cong Tong, Dam Thuy Trang Nguyen, Minh Thanh Do, Mai Hoang Luong, Bernard Journet, Isabelle Ledoux-Rak, and Ngoc Diep Lai, Appl. Phys. Lett. 108, 183104 (2016)
We demonstrate the fabrication of desired structures with feature size below the diffraction limit by use of a positive photoresist. The direct laser writing technique employing a continuous-wave laser was used to optically induce a local thermal effect in a positive photoresist, which then allowed the formation of solid nanostructures. This technique enabled us to realize multi-dimensional sub-microstructures by use of a positive photoresist, with a feature size down to 57 nm. This mechanism acting on positive photoresists opens a simple and low-cost way for nanofabrication.