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Concept for three-dimensional optical addressing by ultralow one-photon absorption method

Qinggele Li, Mai Trang Do, Isabelle Ledoux-Rak, and Ngoc Diep Lai, Opt. Lett. 38, 4640-4643 (2013)

With respect to experimental condition, we have investigated the point spread function of a high numerical aperture objective lens, taking into account the absorption effect of the studied material. By using a material possessing an ultralow one-photon absorption (LOPA) coefficient at the excitation wavelength, the light beam can penetrate deeply inside the material and be tightly focused into a subwavelength spot, almost the same as in the absence of material. Combining tight focusing and ultralow absorption conditions, we show that LOPA-based microscopy is thus capable of three-dimensional imaging and fabrication with long penetration depth up to 300 μm. As compared to the commonly used two-photon absorption microscope, the LOPA method allows simplification of the experimental setup and also minimization of the photodamaging or bleaching effect of materials.

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This work has been supported by the Laboratoire d'Excellence NanoSaclay, in the framework of the project ONE-FAB-3D, and by the Triangle de la Physique, in the framework of the project PUTTON. M. T. Do acknowledge the fellowship from the Vietnam International Education Development 322 program and Q. Li acknowledges the fellowship from the China Scholarship Council.
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